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EDA/IP??

Synopsys, Photronics form DFM collaboration

Posted: 17 Sep 2004 ?? ?Print Version ?Bookmark and Share

Keywords:synopsys? photomasks? design for manufacturing? mask synthesis?

EDA software vendor Synopsys Inc. and Photronics, a photomask company, have formed a collaborative program intended to improve the manufacturability and quality of advanced photomasks and reduce design-to-photomask cycle times, Synopsys said.

Synopsys and Photronics have agreed to explore and develop solutions together in the area of design-for-manufacturing (DFM) and mask synthesis targeting faster time to yield for semiconductor manufacturers. Synopsys did not indicate whether the collaboration would run for a fixed time or its budget.

Specific activities include: improving production of alternating aperture phase shift masks; improving cycle time and yield for masks using strong resolution enhancement techniques (RET); reducing time taken in mask inspection. "Building on a long-standing relationship, Photronics and Synopsys are working together to ensure that the most advanced photomasks are optimized to deliver the highest possible yield.

"Accelerating process complexity necessitates the linking of design tools to photomask fabrication," said Christopher Progler, chief technical officer of Photronics Inc., in a statement issued by Synopsys.

"We expect this will be one of a number of collaborations in which Synopsys will link its comprehensive DFM software solution to technology-leading manufacturers, such as Photronics, to advance the complex technological and business issues of chip manufacturing and ultimately enable our customers to achieve their production and yield goals," said Dan Page, vice president of engineering at Synopsys, in the same statement.

- Peter Clarke

Silicon Strategies





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