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NEC adopts Synopsys' PSM tech

Posted: 22 Dec 2005 ?? ?Print Version ?Bookmark and Share

Keywords:Synopsys? NEC Electronics? phase-shift mask technology? psm technology? processor?

Synopsys Inc. announced that NEC Electronics has adopted Synopsys' phase-shift mask (PSM) technology for production of its high-performance 65nm processor and logic chips. By implementing this key technology, which is part of Synopsys' comprehensive design for manufacturing (DFM) solution, NEC Electronics can enhance yields, decrease leakage current and maximize chip performance through tight critical dimension control over the lithography process, said the press release.

Synopsys added that its PSM technology gives designers the benefit of tighter control of critical dimension (CD), the width of feature sizes on the silicon, and enhanced lithography resolution, which is critical at the 65nm node and beyond. The benefit of this tighter CD is increased chip performance and higher yield, which means more dies on the wafer meet design specifications.

"To increase the performance of our products, we must move to deeper submicron processes and adopt technology that addresses unique manufacturing requirements," said Shuichi Inoue, GM of the manufacturing operations unit at NEC Electronics. "Synopsys' PSM technology substantially enhances the resolution of our existing lithography equipment enabling us to increase our yields, decrease leakage current and improve our chip performance at the 65nm node."




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