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Silicon film, TFTs use micro-liquid processes

Posted: 11 Apr 2006 ?? ?Print Version ?Bookmark and Share

Keywords:silicon film? liquid coating? inkjet patterning process? polysilicon thin-film transistor? LPTS TFT?

Seiko Epson Corp. and JSR Corp. claims to have succeeded in creating the world's first silicon film with liquid coating and inkjet patterning processes. The performance of low-temperature polysilicon thin-film transistors (LTPS TFTs) produced with silicon film formed by the spin coat method is said to be comparable to that achieved when using silicon film formed using the conventional CVD method.

The new material jointly announced by Epson and JSR is a high order silane compound of hydrogen and silicon dissolved in an organic solvent. It forms a silicon film when spin coated on the substrate and baked in an inert atmosphere. When fabricating a TFT prototype using a silicon film formed by spin coating (other than the formation of the silicon coat, the production process is the same as for conventional LTPS TFTs), the electrons achieved mobility of 108cm2/Vs.

Epson used its proprietary micro liquid processes to demonstrate the possibilities of printed TFTs, forming a silicon film pattern onto a substrate by firing the materials onto a substrate using the inkjet method. As a result, part of the pattern formation associated with traditional photolithography is unnecessary, said the company. Forming a TFT prototype using a silicon film pattern using the inkjet method, the electrons achieved mobility of 6.5cm2/Vs, a figure that is said to be lower than that achieved with spin coating. Although improvements need to be made to the inkjet process, Epson believes that printed TFTs show sufficient potential.

This research was commissioned by Japan's New Energy and Industrial Technology Development Organization, an incorporated administrative agency.




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