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ASMI, Hitachi Kakusai sign ALD licensing deal

Posted: 29 Nov 2007 ?? ?Print Version ?Bookmark and Share

Keywords:licensing deal? atomic layer deposition? ALD?

ASM International N.V. (ASMI) and Hitachi Kokusai Electric Inc. have entered into an atomic layer deposition (ADL) licensing deal.

Under the agreement, ASMI will grant usage rights for its ALD patents to Hitachi Kokusai of Japan. Other agreement terms were not disclosed.

A pioneer in ALD, ASMI is said to be the main ALD tool supplier to Intel Corp., enabling the chip giant to deploy its high-k materials for gate-stack applications at the 45nm node.

"We have been proceeding the development of batch ALD over a period of time," said Shoichiro Izumi, general manager of Hitachi Kokusai, in a statement. "We believe that this agreement will make progress in development of ALD technologies, and that we will contribute much further to our customers' advantage."

Aixtron, Applied, Aviza, TEL and others are also selling ALD tools. Tokyo Electron Ltd has reportedly won the high-k dielectrics fab-tool business within IBM Corp.'s "fab club" or technology alliance, according to sources.

- Mark LaPedus
EE Times




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