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Intel gets green light for 65nm at China fab

Posted: 27 Feb 2008 ?? ?Print Version ?Bookmark and Share

Keywords:65nm process node? Intel fab? Dalian China?

Intel Corp. has sought and received permission from the U.S. government to begin manufacturing on the 65nm process at its wafer fab in the China city of Dalian, according to a Shanghai Daily report.

The wafer fab is currently under construction and the timing of operations at the $2.5-billion wafer fab in Dalian has also been refined, the report said. The start of operations is now scheduled for the 1H 2010, along with possibility of the more advanced process technology, the report said, citing Kirby Jefferson, the wafer fab's general manager.

At the time of the announcement of the wafer fab in March 2007, Intel said the plant would begin operations sometime in 2010 on 90nm, which by then would be a trailing-edge process technology. The Shanghai Daily report referenced Jefferson as saying Intel would choose whether to begin manufacturing on 90nm or 65nm in about one year.

Intel broke ground on the shell of Fab 68 in September 2007 and it is expected to cover 163,000sqm of factory space and host a 15,000sqm clean room.

- Peter Clarke
EE Times Europe




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