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EUV light source achieves 104W output

Posted: 28 Apr 2010 ?? ?Print Version ?Bookmark and Share

Keywords:extreme ultraviolet? EUV? lithography? light source?

Japan's Extreme Ultraviolet Lithography System Development Association (EUVA) claims to have achieved the highest output for EUV light source at 104W.

The achievement was made under the Laser Produced Plasma (LPP) Light Source Development Program for EUV Lithography, which is promoted by EUVA.

Within the EUVA, Gigaphoton Inc. has been working on the development of LPP light sources for EUV lithography since 2002. Gigaphoton was founded in 2000 as a joint venture of Komatsu Ltd. and Ushio Inc.

Gigaphoton and Cymer Inc. are racing each other to devise a viable light source for EUV lithography.

"This work has included major breakthroughs in the use of tin (Sn) targets and carbon dioxide (CO2) lasers for improved conversion efficiency, as well as the use of magnetic fields for debris removal," according to the group.

"The ability to achieve a light source output of 100W will drive the cost of ownership of EUV lithography tools down to match that of double-patterning immersion lithography tools. We believe that this, in turn, will increase industry support for EUV lithography and accelerate momentum on achieving further breakthroughs in power to meet the needs for future patterning requirements," said Yuji Watanabe, president of Gigaphoton, in a statement.

"During this quarter, we will begin ramping operations within our state-of-the-art factory to commence initial volume production of EUV light sources with shipments slated for 2011," he said.

- Mark LaPedus
EE Times





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