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Picosun, NCTU invest in new ALD facility in Taiwan

Posted: 24 Mar 2015 ?? ?Print Version ?Bookmark and Share

Keywords:Research? high-brightness light emitting diodes? high electron mobility transistors?

The National Chiao Tung University (NCTU), Taiwan and Picosun, provider of Atomic Layer Deposition (ALD) solutions, partner to build a research laboratory for next generation of micro- and optoelectronics using ALD technology. The Joint Industrial ALD Research Laboratory will be located at the X-Photonics Interdisciplinary Centre in the NCTU premises.

With this collaboration, NCTU and Picosun will develop a wide range of technology solutions for applications such as microelectronic devices for 7nm technology node, high-brightness light emitting diodes (HBLED), and high electron mobility transistors (HEMT). The ALD research laboratory will be geared at conducting fundamental research and advanced device fabrication for industrial applications.

"It's obvious that Picosun, with their world-leading experience in ALD system design and process knowhow, has been chosen as our ALD technology provider. We are happy and excited to start this collaboration to realise a whole new generation of micro- and optoelectronic products," said Professor Hao-Chung Kuo, associate VP of NCTU, and both IEEE and OSA fellow.

"Taiwan is one of the world's leading semiconductor manufacturing hubs. Picosun's state-of-the-art ALD technology is a key enabler for advanced micro- and optoelectronics fabrication. Establishing a partnership and a joint research laboratory with NCTU will provide our existing and future industry customers not only local access to our technology for their applications, but also stronger collaboration ties for future generation products enabled by our ALD technology. This is further supported by our newest subsidiary, Picosun Taiwan, which was established two months ago," said Dr. Wei-Min Li, CEO of Picosun Asia and Applications director of Picosun Group.





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