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Software brings novel features to conventional dry etching

Posted: 04 May 2016 ?? ?Print Version ?Bookmark and Share

Keywords:CORIAL? plasma etching? software? PECVD? ALD?

CORIAL, a provider of plasma etching and deposition equipment for R&D, semiconductor compounds, MEMS and LED industries, has unveiled a software that allows pulsed or time-multiplexed processing on conventional dry process tools.

The company revealed that the COSMA Pulse can control and pulse simultaneously and independently from each other all process parameters, including gas flow rate, working pressure, RF power, LF power, or virtual process parameters.

According to the French company, the software enables designers to add novel capabilities (pulse of process parameters) to conventional dry etching and PECVD systems to perform DRIE-Bosch processing, atomic layer etching (ALE) and/or atomic layer deposition (ALD).

This software ensures that the range of dry etching and deposition techniques from continuous wave plasma to pulsed processing can be realised in conventional ICP-RIE and PECVD tools.





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