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Molecular Imprints comes first in 450mm race
Posted:?Jan 26, 2013 11:35 AM

Molecular Imprints Inc. has recently disclosed that one of their machines are being used by an unnam...[ View complete article ]


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Molecular Imprints comes first in 450mm race

Posted:? Jan 26, 2013 11:35 AM
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Author:ken99

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Molecular Imprints Inc. has recently disclosed that one of their machines are being used by an unnamed semiconductor company to support the development of 450mm diameter wafers.
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EETimes Asia : Energy harvesting market forecast to grow $3B by 2020
(1) Reply:Molecular Imprints comes first in 450mm race Posted:? Jan 26, 2013 11:35 AM
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Author:ken99

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EUV has been re-revealed as x-ray, with all its attendant and classical problems of source, resist and mask. The media, therefore, has moved to the shiny new penny of "lithography in a bottle" (directed self assembly). E-beam direct write, also trying its own EUV-like renaming renaissance (Maskless II), continues struggling with its classical problems of throughput and data management. Meanwhile, imprint, having solved the source, resist and mask, not to mention cost, problems, continues to make quiet progress at Intel and Toshiba. Some really bad bets were made on x-ray and EBDW. DSA is the latest siren on the rocks. Imprint now has the wind at its back.
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