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Micronic expands SLM licensing agreement with German group

Posted: 02 Jan 2002 ?? ?Print Version ?Bookmark and Share

Keywords:micronic laser systems? semiconductor? display? photomask? fraunhofer ims?

Micronic Laser Systems AB, a provider of semiconductor and display laser pattern generators for the production of photomasks, has expanded its cooperation with Fraunhofer Institute for Microelectronic Circuits and Systems (IMS).

The agreement extends by three years the development collaboration between Micronic and Fraunhofer IMS and expands Micronic's present exclusive license rights for spatial light modulator (SLM) technology for direct write and photomask writing with inspection and measurement. The cooperation covers several SLM component generations aimed to support future semiconductor design nodes.

"This agreement with Micronic strengthens the position of Fraunhofer IMS as a research institute in the field of microelectromechanical systems (MEMS)," said Huber Lakner, head of department and program manager of Fraunhofer IMS.

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