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Veeco, Photronics partner in next-generation photomasks

Posted: 09 Jan 2002 ?? ?Print Version ?Bookmark and Share

Keywords:veeco instruments? photronics? reticle? photomask?

Veeco Instruments Inc. and Photronics Inc. have formed a strategic relationship focused on accelerating the development of advanced manufacturing technologies required to fabricate enhanced reticles and next-generation lithography masks.

The initial phase of the relationship includes the purchase of Veeco's NEXUS ion beam deposition (IBD) low defect density (LDD) system by Photronics for deposition of critical films. The companies have also agreed to share technology roadmaps, which is expected to enable Veeco to develop additional process equipment and metrology solutions for advanced photomask applications necessary to expand upon Photronics' sub-wavelength Reticle Solutions platform of proprietary process technology.

"As semiconductor device feature sizes shrink below the exposure wavelength of the lithography tools used to pattern them, demand for advanced reticle technologies will continue to accelerate. Areas where Photronics has emerged as a provider of phase-shift technologies and the development of masks to support EUV lithography, both require advanced thin-film deposition capability," noted Constantine Macricostas, chairman and CEO of Photronics. "We believe Veeco's IBD-LDD system is the most viable production thin-film deposition solution available in supporting our ability to manufacture these advanced products. Our investment in the IBD-LDD serves to differentiate our development activities by demonstrating our commitment to further engage in the design, development, and manufacture of thin-film technology for advanced photomasks."

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