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Cymer unveils dual-discharge-chamber technology

Posted: 13 Mar 2002 ?? ?Print Version ?Bookmark and Share

Keywords:cymer? wafer lithography? duv lithography? deep ultraviolet? duv?

The company has unveiled a dual-gas-discharge-chamber technology that is claimed to deliver higher power and tighter bandwidth for DUV lithography applications across the 248nm, 193nm, and 157nm wavelengths.

Based on the Master Oscillator Power Amplifier architecture, the dual-discharge-chamber technology separates the power and bandwidth generators, enabling each gas discharge chamber to be controlled separately. This is claimed to maximize the bandwidth and pulse energy, as well as achieve higher throughput and smaller dimensions.

Specifically, the master oscillator generates a tight spectrum for high-numerical-aperture lenses at low pulse energy. The power amplifier then intensifies the light in order to deliver the necessary power levels required for high throughput.





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