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TRW demonstrates advanced EUV light source

Posted: 19 Mar 2002 ?? ?Print Version ?Bookmark and Share

Keywords:lithography demonstration? EUV light source? laser? plasma?

A TRW Inc. division said Thursday (March 14) that it and Sandia National Laboratories have conducted a lithography demonstration using a extreme ultraviolet (EUV) light source.

Cutting Edge Optronics Inc. said its demonstration of TRW's "Laser Produced Plasma EUV" light source used a single 500W laser focused on a liquid xenon spray jet target to produce EUV light. Power output of the laser-produced plasma was said to be 30 times greater than an EUV source used earlier in an industry-sponsored engineering test stand used to study lithography technologies and systems. Exposure time per field was reduced from 120s to 4s, the company said.

The test stand was developed by Sandia, Lawrence Berkeley and Lawrence Livermore National Laboratories. The project is funded by the EUV LLC, an IC industry consortium that include Advanced Micro Devices, Infineon Technologies, IBM, Intel, Motorola and Micron Technologies. The consortium is attempting to accelerate commercial development of EUV production tools.

? George Leopold

EE Times

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