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Photronics to construct photomask fab in Shanghai

Posted: 19 Mar 2002 ?? ?Print Version ?Bookmark and Share

Keywords:photomask? 0.25µm process? 0.13µm process? laser lithography tool? electron beam lithography system?

Photronics Inc. will construct a $300-million photomask production facility named Photronics Imaging Technologies (Shanghai) Co. Ltd in Pudong, Shanghai. The first phase of the construction will commence next quarter and is expected to be completed next year. The 18,000-square-meter plant will focus on 0.25?m process and will later switch to 0.13?m process.

Photronics Imaging will adopt Applied Materials ALTA 3500 and 3700 laser lithography tools, Hitachi electron beam lithography systems and KLA-Tencor inspection system.

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