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KLA-Tencor enhances lithography simulation software

Posted: 19 Mar 2002 ?? ?Print Version ?Bookmark and Share

Keywords:prolith? lithography simulation software? lithograph simulation? wafer etching software? wafer etching?

The company announced the addition of an etch modeling and analysis module to its PROLITH lithography simulation and modeling software to provide better awareness and control of the impact of lithographic changes on the quality of IC patterns etched into the semiconductor wafer.

Traditional lithography simulations model the processes involved in reproducing the original IC design as a photoresist pattern on the wafer so that any critical dimension (CD) errors that are likely to arise during patterning can be identified. However, the pattern cannot be changed once it has been etched into silicon. Therefore all CD errors must be identified and corrected prior to etching.

The company claims the PROLITH software allows chip manufacturers to validate and rework their lithography processes to ensure successful production without sacrificing product wafers. The etch software module enables PROLITH to accurately predict the etch process for complex film stacks using one or more etch stages.

The etch simulations include real-world etch effects such as undercutting, shadowing and tapering.

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