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CEO develops 1.5kW laser module for EUV lithography

Posted: 18 Apr 2002 ?? ?Print Version ?Bookmark and Share

Keywords:lithography laser module? elps 600? euv lithography? wafer etching? plasma source?

Cutting Edge Optronics (CEO) Inc. has demonstrated a 1.5kW laser module as a plasma source for extreme ultraviolet (EUV) semiconductor lithography, marking a major step towards the production of commercial EUV lithography equipment that will allow chipmakers to produce faster and smaller circuit features.

"By combining three of the new 1.5kW lasers in one cabinet to generate 4.5kW of laser power, we will produce 25W of clean EUV power. That is a major step toward attaining the EUV power levels required for production lithography," said Armando Martos, CEO's program manager for the EUV source program.

"This laser allows production of EUV energy that is debris-free, spectrally pure and capable of providing high-throughput lithography, claims Richard Walker, president of CEO. "We are confident that the 1.5kW laser demonstrates a practical path to cost-effective EUV lithography."

The 1.5kW module is the basis of CEO's ELPS-600 EUV light source.





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