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Silterra Malaysia, to increase output via $107M investment

Posted: 30 May 2002 ?? ?Print Version ?Bookmark and Share

Keywords:FSG deposition? high-energy implanter? etchers? DUV scanner? metrology tools?

Silterra Malaysia Sdn Bhd, a semiconductor-manufacturing foundry, will invest an additional $107 million in capital equipment. The funds will be used to expand Silterra's facility with additional 0.1875m equipment and to install initial 0.135m equipment.

The 0.185m equipment set is extendable for 0.135m processes. The set includes FSG deposition, high-energy implanter, etchers, DUV scanner and metrology tools. The additional equipment is expected to increase the fab's capacity from 18,000 to 22,000 wafers per month. Further, the tools Silterra is developing for the 0.135m technology includes equipment for low energy ion implant, low temperature nitride deposition, high selectivity etching and advanced metrology tools.

As part of the expansion effort, the company is also enhancing its CIM and IT infrastructure to provide enhanced features and higher capacity for the manufacturing systems.

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