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JMAR receives funding for plasma lithography systems

Posted: 25 Jun 2002 ?? ?Print Version ?Bookmark and Share

Keywords:laser plasma lithography system? GaAs semiconductors? nanostepper?

JMAR Technologies Inc. has received a contract from the U.S. Army Robert Morris Acquisition Center to finance the completion of its integrated proprietary point-source laser plasma lithography systems. The contract is worth $5.34 million.

The prototype system will initially perform sub-130nm lithography demonstrations using GaAs semiconductors. The fully integrated conventional footprint, all-JMAR, Model 5J lithography system consists of a 1nm wavelength laser plasma light source developed by the company's JMAR Research division, combined with an advanced nanostepper designed and built by its JMAR/SAL NanoLithography division.

A significant portion of the funding will be allocated to supporting a series of technology advancement tasks to increase the processing throughput potential of the system for high-resolution GaAs products over the next year and adapt it for processing silicon semiconductor products within the next few years.

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