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Rodel, Nanophase to codevelop CMP slurries

Posted: 03 Jul 2002 ?? ?Print Version ?Bookmark and Share

Keywords:Rodel? nanoparticle technology? chemical mechanical polishing slurries? semiconductor?

Rodel Inc., a manufacturer of integrated materials for the microelectronics industry, has entered into an exclusive long-term supply agreement with Nanophase Technologies Corp.

Rodel will be combining its patented chemistries with Nanophase's latest nanoparticle technology to develop and market chemical mechanical polishing (CMP) slurries for the semiconductor industry.

"Establishing a strategic alliance with Rodel enables Nanophase to develop and penetrate the growing CMP market. Our NanoTek metal oxides, with its very narrow particle size distribution and long term stability, are specifically engineered for these CMP applications," said Joseph Cross, president and CEO of Nanophase.





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