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Cymer DUV lithography light source offers <0.2pm bandwidth

Posted: 29 Jul 2002 ?? ?Print Version ?Bookmark and Share

Keywords:cymer? xla 100? duv lithography light source? lithography light source? deep ultraviolet light source?

Cymer Inc. has announced the availability of the XLA 100 argon fluoride (ArF) light source for DUV lithography that offers <2pm bandwidth at full-width half maximum and <0.65pm at 95 percent energy integral, to enable exposure of the most critical semiconductor features with high numerical aperture (NA) lens designs.

Designed for 248nm, 193nm, and 157nm lithography applications, the light source offers the tight bandwidth while operating at a 4kHz repetition rate and delivering 40W of output power, providing full imaging capability for 200mm and 300mm lithography scanners.

The device is a member of the XL series product line and incorporates the company's Master Oscillator Power amplifier (MOPA) dual-gas-discharge-chamber technology that allow the XLA 100 to achieve its tight bandwidth performance at high power while maintaining a lower cost than existing single-gas-discharge chamber products.

Furthermore, the tight bandwidth of the light source also enables high NA lens designs to require fewer calcium fluoride elements, thereby lowering system cost.

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