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Varian Semi receives control system patent

Posted: 23 Aug 2002 ?? ?Print Version ?Bookmark and Share

Keywords:control system? Varian Control System? VIISta ion implantation systems? wafer ion implantation platform? semiconductor manufacturing facilities?

Varian Semiconductor Equipment Associates Inc., a supplier of ion implantation systems, has obtained U.S. Patent No. 6,374,144 for its developed technology entitled: "Method and Apparatus for Controlling a System Using Hierarchical State Machines." The patent covers Varian's control system, known as the Varian Control System (VCS) for VIISta ion implantation systems.

The VCS executes, monitors, controls, and records the state of independent operations utilizing the VIISta single wafer ion implantation platform, in order to ensure the quality implanter performance in semiconductor manufacturing facilities. VCS also enables e-diagnostic capabilities where the ion implanters in the field can communicate data back to Varian's manufacturing facility.





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