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Applied Materials technology improves Soitec productivity

Posted: 30 Sep 2002 ?? ?Print Version ?Bookmark and Share

Keywords:300mm Smart Cut silicon-on-insulator? Quantum II ion implant system? wafers?

Soitec has achieved a reduction in cycle time for its 300mm Smart Cut SOI (silicon-on-insulator) process as a result of enhancements made by Applied Materials Inc. in its Quantum II ion implant system. According to Applied Materials, by increasing the system's hydrogen beam currents across a range of energies, Soitec was able to boost system productivity by 50 percent.

"The Quantum II systems, which were installed in our new 300mm Bernin 2 production line, allow us to reach a throughput of 17 wafers per hour on 300mm thin SOI wafers, despite the larger implanted area and smaller batch size," said Emmanuel Arene, director of operations at Soitec. "This is especially significant for 300mm manufacturing of SOI substrates to be used for fully depleted SOI transistor structures."

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