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Intel commence operations in latest Mexico facility

Posted: 28 Oct 2002 ?? ?Print Version ?Bookmark and Share

Keywords:semiconductor ic? fab11x? intel?

Chipmaker Intel Corp. has announced the opening of its $2-billion dollar manufacturing facility in Rio Rancho, New Mexico.

Designated as Fab 11X, the 1 million sq. feet facility will manufacture microprocessors on 300mm wafers using Intel's 0.135m process technology. The facility will transition to 90nm process technology in 2003.

"This expansion is the embodiment of our long-held belief that especially in the face of challenging economic times we must continue to invest in new products and manufacturing," said Paul Otellini, Intel president and CEO. "As computing and communications devices converge, the need for increasingly complex components with more capabilities will grow. This facility will help us meet that growing demand. The combination of the 300mm wafers and 90nm process technology will also reduce the costs of manufacturing, increase productivity and improve the availability of the world's most advanced semiconductor products."

The new manufacturing technology enabled by the 300mm technology is expected to provide significant benefits from an environmental perspective. According to Intel, the chips manufactured in Fab11X will require less water and generate fewer emissions per chip than other fabs. Compared to a 200mm facility, Fab 11X is expected to produce 48 percent less volatile organic compound emissions, use 42 percent less ultra pure water, and consume about 40 percent less energy.

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