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Sharp, Mentor Graphics to co-develop optimization tool

Posted: 08 Nov 2002 ?? ?Print Version ?Bookmark and Share

Keywords:co-verification tool? lsi? mentor graphics? c language?

Sharp Corp. and Mentor Graphics Corp. have agreed to jointly develop a next-generation co-verification and design optimization tool that will make it possible to dramatically shorten the time required for design of large-scale, highly integrated system LSIs.

Under this agreement, Sharp and Mentor Graphics will work together to build a tool to provide total system LSI development support, from design to verification, by combining two complementary technologies: Bach, a logic simulator based on the C language jointly developed by Sharp and Sharp Laboratories of Europe Ltd; and Seamless, a hardware/software co-verification environment developed by Mentor Graphics.

The introduction of this tool is expected to significantly shorten the time needed to design large-scale system LSIs.

The two companies also intend to work together in the future on the development of technologies for C-language-based design and verification methodologies, and are aiming for the widespread adoption in the industry of products based on these technologies.

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