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SUSS MicroTec to install lithography line at Taiwan R&D firm

Posted: 24 Jan 2003 ?? ?Print Version ?Bookmark and Share

Keywords:lithography? mask aligner? coating cluster? resistors? mems applications?

SUSS MicroTec has announced that they will install a lithography line at the National Nano Device Laboratories (NDL) in Taiwan. The line consists of an MA150 production mask aligner and an ACS200 coating cluster optimized for thin and thick resist MEMS applications.

SUSS and NDL established a collaboration relationship to open the lithography line to customers and prospective customers for equipment demonstration and evaluation of process technology. According to SUSS, NDL is a suitable partner as the company already uses a SUSS MA6 Mask Aligner for thick resist applications and they have extensive experience with materials and microfabrication of MEMS devices.

Located in the Hsin Chu, Taiwan, NDL employs close to one hundred R&D specialists. Their facility provides technical services that include precision processing and the use of its 64 instruments and major pieces of equipment.

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