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Tegal receives two patents for new etch methods

Posted: 12 Feb 2003 ?? ?Print Version ?Bookmark and Share

Keywords:tegal? sub 0.15um device? mpu? mram? dram?

Tegal Corp. has obtained U.S. Patents Nos. 6,492,280 and 6,500,314 for producing sub-0.155m devices via a unique apparatus and solid source method.

The first patent's focus is on the production of controlled vertical profiles while the second patent enables manufacturers to produce advanced devices using solid source technology thereby extending the capabilities of standard etchers which rely on source gases to define the features for advanced devices. The vertical profiles from both patents can be used for the production of next-generation MPUs, MRAM, DRAM, FeRAM, thin-film head, compound semiconductors, and SoC products.

Both patents leverage the Tegal 6500 series system and process architectures to deliver the pattern fidelity and critical dimension control for sub-0.155m devices.

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