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TSMC adopts Therma-Wave Opti-Probe tool

Posted: 28 May 2003 ?? ?Print Version ?Bookmark and Share

Keywords:tsmc? therma-wave? opti-probe? film measurement system? film metrology?

Taiwan Semiconductor Mfg Co. Ltd (TSMC) has selected Therma-Wave Inc.'s Opti-Probe Measurement Film System as its Tool of Record for 193nm film metrology. TSMC will use the Opti-Probe in its manufacturing fabs to control the thickness and optical properties of the layered materials used to manufacture its most advanced ICs.

"Opti-Probe has five technologies in one tool, and all are matched together by Therma-Wave's calibration techniques with BPR as a foundation. This tool helps TSMC gain tight control of film thickness and optical properties, and achieve good matching, tool-to-tool and fab-to-fab," added Dr. Y.C. Ku, Department Manager for Advanced Lithography in the Micropatterning Technology Division at TSMC.

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