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KLA-Tencor, Carl Zeiss team on 90nm photomasks

Posted: 05 Sep 2003 ?? ?Print Version ?Bookmark and Share

Keywords:kla-tencor? carl zeiss microelectronic systems? photomask? reticle? wavelengths?

KLA-Tencor and Carl Zeiss Microelectronic Systems, a Carl Zeiss SMT subsidiary, have established a strategic alliance to help the semiconductor industry reduce costs and speed time-to-market on next-generation photomasks for the 90nm and below technology nodes.

Company officials report that the joint-development effort is expected to provide customers with the most comprehensive and cost-effective solution available to detect, review and disposition defects on advanced reticles. As a result, photomask manufacturers and chipmakers alike will be able to rapidly identify, source and resolve defect issues to accelerate mask development and improve mask quality control throughout the production process.

Within the alliance, the two companies intend to jointly develop a highly automated interlinked system that enables a broad spectrum of information sharing between KLA-Tencor's TeraScan, TeraStar and STARlight reticle inspection systems, and Carl Zeiss SMT's AIMS fab and AIMS fab plus systems for both 248nm and 193nm wavelengths.

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