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Toshiba device reduces measurement errors

Posted: 09 Jan 2004 ?? ?Print Version ?Bookmark and Share

Keywords:Toshiba? measurement tool? focus measurement technology? semiconductor exposure system? photomask pattern?

Toshiba Corp. has announced that it would market a focus measurement technology that improves the focal measurement performance of semiconductor exposure systems.

Featuring a photomask pattern that reduces measurement errors by approximately 90 percent, the focus measurement tool measures the focal accuracy of semiconductor exposure systems or steppers, which expose circuit patterns on wafers.

The tool is a focus test photomask in which grooves have been cut. Two thirds of the surface area between each groove is shielded with a chrome deposit, forming three distinct areas: the chrome shield, the uncoated glass area, and the grooved area. The latter two are the same width. When a beam of light is shone through the glass, the groove diffracts it, causing a phase shift that can be used to measure the accuracy of the exposure on the silicon wafer.

The error measurement of the tool is approximately 3nm.

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