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Intel grants Cymer $20M funding for EUV litho development

Posted: 28 Jan 2004 ?? ?Print Version ?Bookmark and Share

Keywords:intel? cymer? deep ultraviolet light? duv? extreme ultraviolet?

Intel Corp. has agreed to provide Cymer Inc., a supplier of deep ultraviolet (DUV) light sources used in semiconductor manufacturing, funding of $20 million over the next three years to accelerate development of production-worthy extreme ultraviolet (EUV) lithography light sources.

EUV lithography is positioned for commercial deployment in 2009, but several issues must be addressed to keep the technology on track. A key issue confronting the commercialization efforts of EUV lithography is the ability to increase source output power to meet the wafer throughput requirements of high volume manufacturing, while minimizing the cost of ownership for EUV lithography tools.

"Accelerating EUV technology development to enable its successful implementation in high volume manufacturing for the 32nm node in 2009 is a critical mission at Intel," said Peter Silverman, Intel Fellow and director of Intel's Lithography Capital Equipment Development. "This agreement will further enable Intel and Cymer to concentrate on the critical technology challenges and on delivering a cost-effective, commercial EUV source solution to produce development tools in 2006 and meet the industry's 2009 production timeline."





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