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NTT develops three-dimensional nanofabrication

Posted: 06 Feb 2004 ?? ?Print Version ?Bookmark and Share

Keywords:nippon telegraph and telephone? nanoelectronic device? lithography system? electron beam?

Nippon Telegraph and Telephone Corp. (NTT) has created an electron beam lithography system that enables the fabrication of small 3D structures with sizes measured in nanometers.

According to the company, it has demonstrated the 3D nanopatterning and nanofabrication by exposing a small sphere to the EB to form what it claims to be the world's smallest globe.

NTT aims to apply this technique to nanofabrication on various materials, such as semiconductors. Investigations will be carried out to determine how this technique can be used to make new types of highly functional nanoelectronic devices, says the company.

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