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Nikon laser system features 0.92 NA

Posted: 27 Feb 2004 ?? ?Print Version ?Bookmark and Share

Keywords:nikon? arf excimer laser stepper? nsr-s308f? nsr-s307e?

Nikon Corp. has developed a lens-based scanning ArF excimer laser stepper for use in the mass-production of advanced 65nm or smaller devices.

The Step-and-Repeat System NSR-S308F will be equipped with a 0.92 NA projection lens supporting an ArF excimer laser (193nm wavelength). It offers advancements over the projection lens of the NSR-S307E, which started to be shipped in October of last year.

The system features a 65nm or better resolution, 1:4 reduction ratio, 26-by-33mm exposure area, 8nm or better alignment accuracy, and throughput of 140 wafers or more per hour for 300mm wafers.

The product is priced at around $257M.





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