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Tegal, Sharp partner nano layer deposition development

Posted: 19 Apr 2004 ?? ?Print Version ?Bookmark and Share

Keywords:tegal? sharp laboratories of america? nld?

Tegal Corp. and Sharp Laboratories of America have entered into an agreement to collaborate on a focused joint development program (JDP) to accelerate the adoption and integration of next generation high-K dielectrics.

The JDP builds on Tegal's patented Nano Layer Deposition (NLD) technology for depositing ultra thin layers of new dielectric materials for semiconductor and nanotechnology device production.

The program will be centered at the Sharp Laboratories facility in Camas, Washington and will utilize the Tegal Simplus NLD system already installed there.





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