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TEL, IMEC team up in immersion lithography

Posted: 13 Jul 2004 ?? ?Print Version ?Bookmark and Share

Keywords:imec? lithography? 193nm?

Tokyo Electron Ltd (TEL) has collaborated with IMEC for the research of 193nm immersion lithography. TEL will be providing its coater/developer system, CLEAN TRACK ACT 12, to IMEC for the research, which will be installed in IMEC's new 300mm facility.

Immersion lithography is a technique in which the space between the bottom lens element of the exposure tool and the wafer is filled with liquid instead of air. For 193nm immersion, water has been identified as the most suitable fluid. It is anticipated that this change in technique will impact defects and lithographic performance, such as CD and pattern profile control, by the absorption of water into the resist.

The research between TEL and IMEC will include an investigation of methods to fine-tune resist processing to meet the ITRS's goals for CD control and defect reduction.

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