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Cymer debuts light source for immersion lithography

Posted: 16 Jul 2004 ?? ?Print Version ?Bookmark and Share

Keywords:cymer? excimer light source? xla 200? argon fluoride light source? arf light source?

Cymer Inc., a supplier of deep ultraviolet light sources, has unveiled an excimer light source designed to support immersion lithography at the 45nm manufacturing process node, the company said.

The XLA 200 is the first such source, Cymer claimed, and uses a master oscillator power amplifier design with an argon fluoride (ArF) light source. It should allow a number of different ArF immersion scanners to meet the semiconductor industry's immersion lithography needs, the company shared.

The source operates at a 4kHz repetition rate and delivers 60W of output power. The XLA 200 enables exposure of semiconductor features with greater-than-unity numerical aperture lens designs. The XLA 200 also offers onboard E95 bandwidth metrology.

The XLA 200 debuts only four months after Cymer introduced the XLA 105 and two years after Cymer introduced the industry's first MOPA-based light source, the XLA 100. Deliveries of the first XLA 200 are scheduled for the first quarter of 2005.

- Peter Clarke

Silicon Strategies

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