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Synopsys OPC software increases HHNEC wafer yields

Posted: 22 Oct 2004 ?? ?Print Version ?Bookmark and Share

Keywords:synopsys? shanghai hua hong nec electronics? proteus optical proximity? software? Jazz?

Synopsys Inc. revealed that Shanghai Hua Hong NEC Electronics Ltd (HHNEC) has adopted its Proteus optical proximity correction (OPC) software. HHNEC is a joint venture between NEC Corp., Jazz Semiconductor and Shanghai Hua Hong Group, and is an 8-inch semiconductor foundry in China. HHNEC selected Proteus to increase accuracy, decrease mask synthesis turn-around-time and obtain higher yields.

"Using Proteus OPC increases our critical dimension accuracy and ability to manufacture high yield chips with quick turn around time for our demanding customers," said Lei Ping Lai, chief marketing and technology officer, HHNEC. "Synopsys offers comprehensive mask synthesis solutions that offer reliable and fast results for our manufacturing needs," Lai added.

As process node size decreases, the processing time for OPC increases. According to Synopsys, Proteus' distributed processing architecture provides near-linear scalability that allows customers to reduce turn-around-time by using clusters of inexpensive Linux-based CPUs.

Edmund Cheng, VP of marketing for DFM at Synopsys, stated, "Synopsys continues to solve the growing manufacturing and production issues by offering comprehensive design-for-manufacturing (DFM) solutions in mask synthesis, mask data preparation, TCAD and lithography verification."





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