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UMC enhances 90nm manufacturability with Synopsys AA-PSM

Posted: 23 Dec 2004 ?? ?Print Version ?Bookmark and Share

Keywords:aperture phase-shift mask? aa-psm? 90nm? fpga?

United Microelectronics Corp. is using Synopsys Inc.'s alternating aperture phase-shift mask (AA-PSM) technology to enhance manufacturability for its 90nm process. The companies engineers worked together to retarget an FPGA chip to the AA-PSM process using Synopsys' DFM flow. The flow consisted of Proteus optical proximity correction (OPC) software, Synopsys' AA-PSM technology, SiVL lithography verification software, Hercules design rule check (DRC) and mask rule check (MRC) tools, and CATS fracturing software.

Peter Huang, deputy director of the central research and development advanced module division at UMC, said, "We are delighted to see the positive results of our AA-PSM efforts with Synopsys for our mainstream 90nm process. This success not only enhances our current production, but also demonstrates the viability of this solution for future process generations below 90nm. Technologies now under industry development, such as immersion lithography, have yet to be proven in a real-life manufacturing environment, while AA-PSM has already been validated in our fab with production silicon."

Edmund Cheng, VP of marketing, silicon engineering group at Synopsys, added, "We are very pleased to collaborate with UMC in applying the capabilities of Synopsys' AA-PSM technology to improve lithography resolution. The outcome further validates Synopsys' leadership position in providing a comprehensive DFM solution for high-yield designs at 90nm and below."

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