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Synopsys develops reference design flow with China's chip foundry

Posted: 20 Jan 2005 ?? ?Print Version ?Bookmark and Share

Keywords:grace semiconductor? 180nm processes? rtl-to-gdsii flow? galaxy design? discovery verification platform?

Synopsys Inc. and Grace Semiconductor Mfg Corp., an IC foundry in Shanghai, China, have jointly developed a reference design flow for Grace's 180nm processes. The RTL-to-GDSII flow is based on Synopsys' Galaxy Design and Discovery verification platform.

"We chose Synopsys as our preferred EDA partner to create our first reference design flow because of their reputation in the market and their proven design solution. This relationship gives Grace and its customers a completely integrated, silicon-proven design and verification flow that will speed up product development time for complex 180nm designs," said Fang Hao, senior director of technology development at Grace.

Grace currently supports 250nm, 220nm, 180nm, and 150nm process technologies, and will soon support 130nm.

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