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Memory/Storage??

1st Silicon starts production of Sharp's flash technology

Posted: 11 May 2005 ?? ?Print Version ?Bookmark and Share

Keywords:nor flash? 1st silicon?

1st Silicon Sdn. Bhd. has completed qualification and begun production shipment of Sharp Corp.'s 0.13?m NOR flash technology.

The NOR Flash technology fabricated at 1st Silicon's (Sarawak, Malaysia) wafer fab achieves flash-memory densities up to 128Mb manufactured using an aluminum back end process.

1st Silicon has not officially announced its 130nm process. The Malaysia foundry provider apparently obtained the process from its largest customer in Sharp of Japan.

Malaysian foundry chipmaker 1st Silicon has also begun shipping flash memory it embedded in a 0.25?m manufacturing process. The process combines SuperFlash split-gate flash cell memory technology from Silicon Storage Technology Inc., with a 1st Silicon 0.25?m logic process. The process can be used to make microcontrollers used in consumer, communications and computer applications, the company said.

The foundry, established in 1998, is a 200mm fab is designed to handle up to 45,000 wafers per month at full ramp capacity for geometries from 0.25?m down to 0.13?m. It currently offers volume production of digital and mixed-signal CMOS technologies in 0.25- and 0.18?m processes, and will go into production on 0.15?m processes the third quarter.

"We are very proud to be the first foundry in Malaysia to be in production at the 0.13?m node," said John Nelson, chief executive of 1st Silicon, in a statement. "Sharp Corp. is our initial technology partner and we are delighted to announce this successful third-generation technology transfer."

- Spencer Chin

EE Times





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