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Annual ARS focuses on impact of semiconductor worldwide

Posted: 23 Jun 2005 ?? ?Print Version ?Bookmark and Share

Keywords:semiconductor? moore's law? tsmc? vlsi research?

In view of the 40th anniversary of Moore's law, the 11th annual Advanced Reticle Symposium (ARS) will address the state of semiconductor technology advancement and its impact not only on economic growth but also on society worldwide.

This year's opening plenary session will feature presentations by Dan Hutcheson, CEO of VLSI Research, Rick Cassidy, president of TSMC North America and Chris Malachowsky, co-founder and senior vice president of Engineering and Operations at NVIDIA. These semiconductor supply chain experts will offer their perspectives on photomask issues and the impact of Moore's Law.

Attendees will examine and discuss a broad range of topics on the challenges of designing at process nodes of 90nm and below, and how these challenges impact time-to-yield, value chain optimization, technology and business trends, the exponential growth in data volumes, and verification strategies.

The program will also feature presentations from analysts and experts at Gartner/Dataquest, DNP, Micronic Laser Systems, Photronics, Synopsys and Toppan Photomasks. In addition, attendee participation is encouraged during the afternoon panel discussion, "Is Moore's Law Valid in Today's Environment?" Supporting sponsors for this year's symposium include DNP, Microlithography World Magazine, Micronic, Pennwell, Photronics, Solid State Technology Magazine, SPIE, Synopsys, Toppan Photomasks Inc. and Ultratech.

"Forty years ago, Gordon Moore predicted the world of soaring gate counts that we are dealing with today," said Raul Camposano, SVP, and general manager, Silicon Engineering Group at Synopsys.

"Deep submicron process nodes and physical limitations are impacting the way we design silicon devices and challenging existing business models. The overarching need for design for manufacturing (DFM) techniques throughout the design cycle is unmistakable. Only through collaboration among design and manufacturing companies, and a holistic approach to DFM throughout the design cycle, will we be able to meet the challenges that have arisen as a result of the complexity Moore predicted," Camposano added.

The Advanced Reticle Symposium is a forum dedicated to the discussion of the "tech-onomics" of advanced photomasks. This one day forum draws together a combination of executives, engineering managers, technologists and key decision makers from design, equipment, software, photomask and fab and fabless semiconductor companies. Last year more than 300 people attended ARS.

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