Global Sources
EE Times-Asia
Stay in touch with EE Times Asia
EE Times-Asia > Memory/Storage

Mattson wins follow-on strip, RTP orders from Promos

Posted: 14 Sep 2005 ?? ?Print Version ?Bookmark and Share

Keywords:aspen iii icpht? helios rtp systems? 512mb? 1gb? ddr dram?

Mattson Technology Inc., a supplier of advanced process equipment used to manufacture semiconductors, has received follow-on orders for its Aspen III ICPHT and Helios RTP systems from Promos Technologies.

The systems are scheduled to begin shipment in this month and will be used in Promos' 300mm Fab 3 at Central Taiwan Science Park (CTSP) for the volume production of advanced memory devices, including 512Mb and 1Gb DDR2 DRAM stacked capacitors with 90nm technology.

"Memory chipmakers require advanced tools with processing capabilities to address the most challenging applications and increase productivity for manufacturing at the 90nm node and beyond," said Randy Y. Matsuda, Mattson Technology's global business operations VP & general manager, Asia.

Featuring Mattson's proprietary inductively coupled plasma (ICP) source technology, the Aspen III ICPHT provides increased throughput, improved process performance and reliability for FEOL and BEOL strip applications.

The Helios addresses the most demanding RTP applications, including nickel silicide formation and ultra-shallow junction spike anneals, enabled by an advanced model-based temperature control for high productivity.

Article Comments - Mattson wins follow-on strip, RTP or...
*? You can enter [0] more charecters.
*Verify code:


Visit Asia Webinars to learn about the latest in technology and get practical design tips.

Back to Top