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Platform partners integrate design-for-manufacturing

Posted: 23 Sep 2005 ?? ?Print Version ?Bookmark and Share

Keywords:chartered semiconductor? design-for-manufacturability? eda? 90nm? 65nm?

IBM, Chartered Semiconductor Mfg and Samsung Electronics Co. Ltd have entered into an initial set of solutions for their cross-fab, common design-for-manufacturability (DFM) initiative. The multi-faceted effort, which includes participation by electronic design automation (EDA) and DFM tool suppliers, is expected to offer a series of rules, models and utility kits that provide new levels of predictability and control to achieve working silicon faster and yield ramp more efficiently.

The DFM initiative builds on the companies' breakthrough jointly developed common platform for 90nm and 65nm nodes and is supported by an extensive ecosystem of design enablement resources.

The DFM initiative addresses manufacturability as the newest, most pressing design closure challenge faced by designers targeting processes at 90nm and below. It is targeted to provide enhanced depth and detail in its models, data, analysis capabilities and shapes manipulation, which are based on both statistical modeling of advanced manufacturing characteristics, as well as actual data derived from silicon production at the three manufacturing leaders.

The collaborative effort is targeting the development of a shared manufacturing-aware design methodology, which enables designers to quickly and efficiently identify possible yield detractors, target those that are most significant, and make intelligent trade-offs. It is focused on eight key components to meet the needs of designers implementing on leading-edge process technologies, drawing on multi-discipline expertise including design, device physics, process and manufacturing. These eight key components include: DFM design guidelines, DFM checking decks, yield enhancement design flows, lithography/shape simulation, chemical mechanical polishing (CMP) simulation, critical area analysis, statistical timing analysis and optimization, DFM services, such as library certification and layout review.

Individually, the focus areas will benefit from close cooperation with EDA and DFM suppliers to offer designers detailed views, guidelines and models that are based on manufacturing data for designing to the specific physical characteristics of highly complex manufacturing processes. Combined, they provide more comprehensive visibility into manufacturing effects so as to enable the designer to better anticipate yield ramp as a part of the design process.

The DFM initiative is built upon the foundation of the companies' common design enablement strategy, which includes a set of common reference flows and technology kits that support the use of the most popular EDA tools, libraries and IP cores. The resulting DFM solution will become an integral part of the Common Platform and is to be implemented through a combination of rules- and model-based design kits, containing critical information required by designers to better predict the impact of their decisions on manufactured designs over a variety of operating ranges and conditions.





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