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Toshiba and NEC team up on 45nm system LSI

Posted: 10 Nov 2005 ?? ?Print Version ?Bookmark and Share

Keywords:lsi? cmos? 45nm? process technology? toshiba?

Toshiba Corp. and nec Electronics Corp. have announced a collaboration on the development of CMOS logic process technology for the 45nm generation. The joint development will allow the companies to share responsibilities and accelerate development, while improving system LSI performance and quality.

Under the terms of the agreement, engineers from Toshiba and NEC Electronics will work at Toshiba's Advanced Microelectronics Center in Yokohama on the development of fundamental CMOS process technology, which both companies will be able to implement at their manufacturing facilities. The companies will also separately discuss how to handle the development of value-added and differentiated process technologies.

Process technologies are shrinking to achieve high-speed, low-power system LSI for application in digital consumer products and mobile communication equipment, and products with 90nm technologies are entering volume production. 65nm and 45nm process technologies are now being developed to achieve further improvements in performance and power consumption.

Toshiba and NEC Electronics will integrate process technologies they have heretofore developed individually, and share newly-developed technologies. They have also begun to discuss comprehensive collaboration in development, such as design environments and product development, as well as collaboration in manufacturing to achieve more efficient use of capital investment and increase capacity utilization rates.

Both companies expect the joint effort to reduce development burdens and to shorten turn-around times for highly advanced system LSI. Toshiba sees future increases in utilization rates at its most advanced system LSI production facility, while NEC Electronics expects to focus on the development of value-added system LSI products, by focusing on differentiated process technologies.





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