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Intel to build 300mm wafer fab in Israel

Posted: 05 Dec 2005 ?? ?Print Version ?Bookmark and Share

Keywords:Intel? 300mm? wafer fab?

Intel Corp. announced plans to build a new 300mm wafer fabrication facility at its site in Kiryat Gat, Israel. The new factory, designated Fab 28, will produce microprocessors on 45nm process technology in the second half of 2008. Construction on this $3.5 billion project, Intel's second 45nm factory, is set to begin immediately.

Once completed, Fab 28 will become Intel's seventh 300mm wafer facility, and will include approximately 200,000 square feet of clean room space. Over the next several years, the project will create more than 2,000 Intel jobs at the site. According to the press release, the Israeli government is providing financial incentives for the new facility.

"This announcement reaffirms that Intel platforms will contain the most advanced and innovative technology in the world for years to come," commented Paul Otellini, president and CEO of Intel.

Intel currently operates five 300mm fabs that provide the equivalent manufacturing capacity of about eight older generation 200mm factories. Those factories are located in Oregon, Arizona and New Mexico. Additionally, an expansion of Intel's 300mm capacity in Ireland (Fab 24-2) is scheduled to begin in the Q1 of 2006.




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