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Ion implanter designed for sub-65nm manufacturing

Posted: 26 Jan 2006 ?? ?Print Version ?Bookmark and Share

Keywords:Optima HD? ion implanter? sub-65nm? manufacturing? Axcelis Technologies?

Axcelis Technologies Inc. introduced the Optima HD, an ion implanter designed to address traditional high dose implants as well as the expanding range of applications in sub-65nm generation device manufacturing.

This new low energy, high dose system offers an energy range from 200eV to 80KeV, enabling customers to cover traditional high dose implants while providing significant mid-dose applications overlap. The product also supports molecular and hydrogen implants for emerging dual poly gate and silicon-on-insulator applications.

According to Mary Puma, chairman and CEO of Axcelis, the company designed Optima HD to support the fundamental changes happening in transistor formation as manufacturing moves into sub-65nm technology nodes. The product was born out of Axcelis' strategy to develop extendible implant technologies that give customers the most flexibility to address current requirements while meeting the challenges emerging from new generations of transistor designs and device structures," said Puma.

The Optima HD delivers implants using advanced spot beam technology, which is said to ensure that all points across the wafer see the same beam at the same angle, resulting in implant repeatability. In addition, the system uses Axcelis' proprietary RadiusScan technology, a hardware feature that claims to enhance productivity and allows the system to cover a broad dose range, enabling customers to address both traditional and emerging high dose implant needs.

The company expects to ship the first systems during Q2 2006.




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