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NEC, Sony, Toshiba to develop 45nm system LSI process tech

Posted: 03 Feb 2006 ?? ?Print Version ?Bookmark and Share

Keywords:Yoshiko Hara? NEC Electronics? Sony? Toshiba? 45nm?

NEC Electronics Corp., Sony Corp. and Toshiba Corp. announced that they have agreed to jointly develop system LSI process technologies for the 45nm generation.

As applications in the digital consumer, mobile, and communications arenas evolve, there are greater requirements for advanced system LSI technologies to achieve higher performance and functionality, such as high-speed data processing, as well as lower power consumption and smaller chip dimensions. Meeting these requirements for leading edge system LSI process technology development requires a tremendous investment of development resources that semiconductor companies worldwide are working together with the goal of more efficient development.

In February 2004, Sony and Toshiba announced their collaboration on 45nm system LSI process technology development, and have since proceeded with technology development based at Toshiba's Advanced Microelectronics Center in Yokohama, Japan. Likewise, NEC Electronics and Toshiba announced their agreement to jointly develop 45nm process technology in November 2005, and have been in discussions to decide the details of that collaboration.

With the new agreement, NEC Electronics' 45nm development team will join Sony and Toshiba's ongoing work on 45nm technology development at the Advanced Microelectronics Center. By combining the all their development resources, the companies are expected to raise development efficiency and further accelerate the pace of development, aiming to establish 45nm system LSI process technology quickly.

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