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KLA-Tencor unveils latest-gen optical CD metrology system

Posted: 17 Feb 2006 ?? ?Print Version ?Bookmark and Share

Keywords:SpectraCD-XT? CD metrology system? KLA-Tencor? 90nm? 65nm?

KLA-Tencor introduced its latest-generation optical CD metrology system, the SpectraCD-XT, which provides cost-effective inline CD and profile measurements of critical device structures that help enable early prediction of IC performance and yield at the 90nm and 65nm nodes.

Touted to be the only high-performance spectroscopic ellipsometry-based CD metrology tool with sub-2s move-acquire-measure (MAM) time, the SpectraCD-XT provides a two-fold increase in throughput compared to KLA-Tencor's previous platform, the company said. This enables chipmakers to meet their increased sampling requirements at the lowest cost-per-yield-relevant measurement.

According to the press release, the SpectraCD-XT with SE technology offers leading precision on advanced applications where device structures are highly complex and require multiple types of measurements, such as shallow trench isolation, gate and spacer. KLA-Tencor's SE optics uses oblique illumination to enable the identification of smaller structural anomalies-such as notching and footing of gate profiles-that more accurately correlate to end-of-line device performance and yield. Emerging optical CD metrology applications include contact holes, BEOL trenches and vias, and scanner qualification.

Additionally, said KLA-Tencor, improved model setup and analysis tools embedded on the SpectraCD-XT speeds library generation by 30 to 60 times, providing significant savings in time and engineering resources, which in turn, help enable faster yield learning on new technologies. The system is also built on a platform with proven reliability in high-volume production.

"In wafer patterning, the quality of gate and STI structures is a key contributor to the maximum performance potential of semiconductor devices," said Avi Cohen, group vice president of the parametric solutions group at KLA-Tencor. "Our customers want careful monitoring and control over these structures to ensure that products at end-of-line test meet required performance specifications."




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