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Taiwan DRAM maker places follow-on orders for Mattson's strip system

Posted: 30 Mar 2006 ?? ?Print Version ?Bookmark and Share

Keywords:Mattson Technology? process equipment? semiconductor? DRAM? Aspen III?

Mattson Technology Inc., a supplier of advanced process equipment used to manufacture semiconductors, disclosed that a major DRAM chipmaker from Taiwan has placed follow-on orders for Mattson's Aspen III ICPHT strip system for the next expansion phase of its 90nm and 300mm fab.

Built upon the production-proven Aspen III platform, said the press release, the Aspen III ICPHT utilizes an enhanced RF plasma source with Mattson's proprietary inductively coupled plasma (ICP) technology to provide a wider process window for front-end-of-line (FEOL) and back-end-of-line (BEOL) strip applications. Featuring high-speed, dual-wafer handling and a modular design, the system provides the excellent process performance, high reliability, increased throughput and low cost of ownership required for cost- effective chip manufacturing.

"The Aspen III ICPHT continues to be this DRAM manufacturer's tool of record for photoresist strip based on the system's proven productivity, reliability and process flexibility," said Ming Kao, Mattson's Taiwan country manager. "Our dependable customer support infrastructure in Taiwan was another key factor in the chipmaker's decision to again select Mattson, and we look forward to continuing to supply the tools and technologies our customer needs to ramp 300mm production of its advanced memory devices."

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