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Sony adopts Synopsys PSM tech

Posted: 20 Apr 2006 ?? ?Print Version ?Bookmark and Share

Keywords:Synopsys? Sony? AA-PSM?

Synopsys Inc. announced that Sony Corp. has adopted Synopsys' alternating aperture phase-shift mask (AA-PSM) technology to enhance the manufacturability of its high-performance chips.

According to the press release, the AA-PSM technology, which is part of Synopsys' design for manufacturing (DFM) product family, enables manufacturability improvements through increased lithography resolution, enhanced yields, decreased leakage current and better chip performance.

Synopsys' phase-shifting software and technology has been validated with production silicon since the 130nm node and is the only commercially available strong phase-shifting technology being used by several leading-edge semiconductor companies in IC production. For designers, the benefit of this technology is tighter control of critical dimension (CD), the width of feature sizes on the silicon, and enhanced lithography resolution which is critical at the 65nm node and beyond. This tighter CD results in increased chip performance and higher yield, which means more dies on the wafer meet design specifications.

"Our ability to support Sony's industry-leading production ramp of their advanced process nodes demonstrates our PSM technology's continued value in a production environment," said Anantha Sethuraman, vice president of marketing for DFM, Synopsys. "This validates Synopsys' leadership position in providing a comprehensive DFM solution for high-yield designs."

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