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CMOS process tech features high-density EEPROM

Posted: 08 Jun 2006 ?? ?Print Version ?Bookmark and Share

Keywords:Atmel? AT35700? 0.35μm? CMOS? process?

Atmel Corp. has announced the release of its AT35700 high-voltage process technology with double-poly, high-density EEPROM for IC foundry customers. The company said this 0.35m technology has LDMOS transistors capable of 17V and 40V operation and has a 5V low-leakage CMOS core.

Atmel said the low-leakage CMOS has been engineered to minimize sub-threshold leakage currents, making this technology suitable for portable electronic devices. Isolated NMOS and LDMOS transistors promise to minimize circuit noise. A large selection of on-chip analog resistors and capacitors are included to reduce off-chip component requirements. The technology supports placement of ESD and I/O transistors under the bond pads, thus minimizing the die size, the company explained.

The new device also features Atmel's double-poly, high-density memory cell. The cell can be used to create parallel, serial, or pseudo Flash memory designs. Having embedded EEPROM provides large data storage capability as required in monitor and control applications and eliminates the need for additional memory chips, said the company.

This high-voltage process technology is suitable for mixed-signal, power management, motor and motion control, and automotive monitoring and control applications. Atmel said these applications can be expanded with design solutions enhanced with the company's workhorse AVR microcontroller line.

Multi-project wafersAtmel said it is offering frequent MPW runs that provide an economical means for customers to debug and prototype devices without purchasing an entire mask set. Multiple customers share the same reticle and wafer-run, thereby reducing the cost of entry. Prices for MPW runs are dependent on the die size.

Design kitsThe company is also offering a wide range of mature libraries that support accurate mixed-signal simulation within the Cadence Design Environment. Its 35700 0.35m high-voltage CMOS process is available now.

Atmel said it is providing IC foundry technologies with geometries ranging from 0.8m to 0.13m, along with fully characterized design kits and a large IP library. Atmel also offers additional support services including design, advanced packaging, testing, characterization, and qualification.

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